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US Patent Issued to Tripod Technology on July 14 for "Method for forming film" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,155, issued on July 14, was assigned to Tripod Technology Corp. (Taoyuan City, Taiwan). "Method for forming film" was invented by Yu-Ming C... Read More


US Patent Issued to CANON on July 14 for "Cooling device, semiconductor manufacturing apparatus, and semiconductor manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,156, issued on July 14, was assigned to CANON K.K. (Tokyo). "Cooling device, semiconductor manufacturing apparatus, and semiconductor manuf... Read More


US Patent Issued to Shincron on July 14 for "Film formation control device, film formation device and film formation method" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,157, issued on July 14, was assigned to Shincron Co. Ltd. (Kanagawa, Japan). "Film formation control device, film formation device and film... Read More


US Patent Issued to APPLIED MATERIALS on July 14 for "Selective cobalt deposition on copper surfaces" (California Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,158, issued on July 14, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.). "Selective cobalt deposition on copper surfaces" was ... Read More


US Patent Issued to Lam Research on July 14 for "Chamber-accumulation extension via in-situ passivation" (Oregon Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,159, issued on July 14, was assigned to Lam Research Corp. (Fremont, Calif.). "Chamber-accumulation extension via in-situ passivation" was ... Read More


US Patent Issued to Kokusai Electric on July 14 for "Nozzle cleaning method, substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,160, issued on July 14, was assigned to Kokusai Electric Corp. (Tokyo). "Nozzle cleaning method, substrate processing method, method of man... Read More


US Patent Issued to SAMSUNG ELECTRONICS, INDUSTRY-ACADEMIC COOPERATION FOUNDATION, UNIVERSITY on July 14 for "Semiconductor process system and method of cleaning the same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,161, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and INDUSTRY-ACADEMIC COOPERATION FOUNDATION, U... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on July 14 for "CVD device pumping liner" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,162, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "CVD device pumping liner" was inven... Read More


US Patent Issued to Applied Materials on July 14 for "Reactor for coating particles in stationary chamber with rotating paddles and gas injection" (Indian, American Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,163, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Reactor for coating particles in stationary chamber ... Read More


US Patent Issued to Lam Research Salzburg on July 14 for "Distribution body for distributing a process gas for treating a substrate by means of the process gas" (Austrian Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,164, issued on July 14, was assigned to Lam Research Salzburg GmbH (Salzburg-Gnigl, Austria). "Distribution body for distributing a process... Read More